Search Results for thin films

This chapter presents the theory and practice associated with the application of thin films. The first half of the chapter describes physical deposition processes in which functional coatings are deposited on component surfaces using mechanical, electromechanical, or thermodynamic techniques. Physical vapor deposition (PVD) techniques include sputtering, e-beam evaporation, arc-PVD, and ion plating and are best suited for elements and compounds with moderate melting points or when a high-purity film is required. The remainder of the chapter covers chemical vapor deposition (CVD) processes, including atomic layer deposition, plasma-enhanced and plasma-assisted CVD, and various forms of vapor-phase epitaxy, which are commonly used for compound films or when deposit purity is less critical. A brief application overview is also presented.

This appendix provides a brief review of thin film deposition methods and their uses in a question and answer format. The questions deal with recommended practices, process conditions, terminology, and classifications.

Post-mortem analysis of photovoltaic modules that have degraded performance is essential for improving the long term durability of solar energy. This article focuses on a general procedure for analyzing a failed module. The procedure includes electrical characterization followed by thermal imaging such as forward bias, reverse bias, and lock-in, and emission imaging such as electroluminescence and photoluminescence imaging.

This article briefly describes the historical development of fracture resistance testing of polymers and reviews several test methods developed for determining the fracture toughness of polymeric materials. The discussion covers J-integral testing, the methods for determining linear elastic fracture toughness, testing of thin sheets and films, normalization methods, and hysteresis methods.

This chapter begins with an overview of the history of ion nitriding. This is followed by sections that describe how the ion nitriding process works, glow discharge characteristics, process parameters requiring good control, and the applications of plasma processing. The chapter explores what happens in the ion nitriding process and provides information on its gas ratios. It describes the reactions that occur at the surface of the material being treated during iron nitriding and defines corner effect and nitride networking. Further, the chapter provides information on the stability of surface layers and processes involved in the degradation of surface finish and control of the compound zone formation. Gases primarily used for ion nitriding and the control parameters used in ion nitriding are also covered. The chapter also presents the philosophies and advantages of the plasma generation technique for nitriding. It concludes with processes involved in oxynitriding.

Steel heated in contact with air at temperatures in the tempering range takes on various temper colors due to the formation of a thin oxide film. This appendix provides information on the cause and source of oxidation of steel and time-temperature effect on SAE 1035 steel. In addition, figures that show temper colors after heating 1035 steel in circulating air are presented.