1-20 of 37 Search Results for

plasma-enhanced CVD

Follow your search
Access your saved searches in your account

Would you like to receive an alert when new items match your search?
Close Modal
Sort by
Series: ASM Technical Books
Publisher: ASM International
Published: 31 January 2023
DOI: 10.31399/asm.tb.itfdtktmse.t56060013
EISBN: 978-1-62708-440-6
...-enhanced CVD process temperature sputtering thin film purity vacuum ion plating Problem 1 Gas leaks into a vacuum chamber at a rate of 5 cm 3 atm sec −1 . The pump has a volumetric flow rate of 2000 liters sec −1 . Calculate the limiting achievable pressure. Solution P = Q / S...
Series: ASM Technical Books
Publisher: ASM International
Published: 31 January 2023
DOI: 10.31399/asm.tb.itfdtktmse.t56060001
EISBN: 978-1-62708-440-6
...) processes, including atomic layer deposition, plasma-enhanced and plasma-assisted CVD, and various forms of vapor-phase epitaxy, which are commonly used for compound films or when deposit purity is less critical. A brief application overview is also presented. arc-PVD chamber pressure chemical...
Series: ASM Technical Books
Publisher: ASM International
Published: 31 January 2023
DOI: 10.31399/asm.tb.itfdtktmse.9781627084406
EISBN: 978-1-62708-440-6
Series: ASM Technical Books
Publisher: ASM International
Published: 01 January 1998
DOI: 10.31399/asm.tb.ts5.t65900305
EISBN: 978-1-62708-358-4
... and TiN coating reactions are relatively high, around 1000 °C (1830 °F). However, CVD deposition temperatures can be lowered if the CVD reactions are carried out in an environment of glow discharge plasmas maintained at the substrate/vapor interface ( Ref 37 ). These processes are referred to as plasma...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 August 2012
DOI: 10.31399/asm.tb.smfpa.t53500317
EISBN: 978-1-62708-317-1
... in the vapor phase ( Fig. 16.20 ). As shown in Fig. 16.14 , typical coating thicknesses are 4 to12 μm, and process temperatures are typically around 800 to 1050 °C (1475 to 1925 °F). However, recent technology enabled plasma-assisted CVD (also known as plasma-enhanced CVD), which can reduce the process...
Book Chapter

Series: ASM Technical Books
Publisher: ASM International
Published: 01 January 2015
DOI: 10.31399/asm.tb.spsp2.t54410551
EISBN: 978-1-62708-265-5
.... Source: Ref 22.40 , 22.41 Fig. 22.12 ZrN coating deposited by triode ion plating. Scanning electron micrograph. Courtesy of A.S. Korhonen, Helsinki University of Technology. Source: Ref 22.40 , 22.41 Chemical Vapor Deposition Chemical vapor deposition (CVD) is a coating process...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 July 2009
DOI: 10.31399/asm.tb.bcp.t52230361
EISBN: 978-1-62708-298-3
... in the following order: sputtering, evaporation, CVD, electroplating, and plasma spraying [ Beat 2005 ]. 22.2 Physical Vapor Deposition Physical vapor deposition processes involve the creation and condensation of vapors onto substrates to form coatings or films. Figure 22.1 illustrates schematically...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 March 2001
DOI: 10.31399/asm.tb.secwr.t68350125
EISBN: 978-1-62708-315-7
... 2.5–250 0.1–10 49–70 (Ni-P) Very good (Ni-P) No 85–95 185–205 Liquid Atmosphere <1–10 Yes No CVD 1–1300 0.04–50 90–92 (TiC) Very good No 820–1200 1500–2200 0.013–100 0.1–760 10–60 Yes Reheat treatment PVD 0.025–10 0.001–0.4 93–95 (B 4 C) Excellent Yes 95–540 200...
Book Chapter

Series: ASM Technical Books
Publisher: ASM International
Published: 01 November 2013
DOI: 10.31399/asm.tb.mfub.t53740325
EISBN: 978-1-62708-308-9
... acids, such as citric, oxalic, acetic, tartaric, and gluconic acids, occupy an important place in acid cleaning because of their chelating capability. Phosphoric Acid Etching Phosphoric acid is often used as an etchant for nonferrous metals (such as copper, brass, aluminum, and zinc) to enhance...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 June 2022
DOI: 10.31399/asm.tb.tstap.t56040020
EISBN: 978-1-62708-428-4
... and droplet deposition. The coatings exhibit similar quality to those produced by physical vapor deposition (PVD) or chemical vapor deposition (CVD); however, the VLPPS deposition rates can be an order of magnitude higher. The VLPPS process can be used to produce dense, high quality coatings in the 1 to 100...
Book Chapter

Series: ASM Technical Books
Publisher: ASM International
Published: 01 December 2003
DOI: 10.31399/asm.tb.pnfn.t65900071
EISBN: 978-1-62708-350-8
... the thin-film material can bond. An example of thin-film processing is plasma-assisted chemical vapor deposition (PA-CVD) using chromium, tungsten, aluminum, titanium, metallic-carbon combinations, or other materials. Techniques are available for creating duplex thin-film deposits. What Happens...
Book Chapter

Series: ASM Technical Books
Publisher: ASM International
Published: 01 June 2008
DOI: 10.31399/asm.tb.emea.t52240411
EISBN: 978-1-62708-251-8
... required to produce martensite. Many tool steels have molybdenum, chromium, and manganese as alloying additions to improve hardenability. A high carbon content is required to obtain tempered martensite with a high hardness. In addition, wear resistance is enhanced by the presence of hard second-phase...
Book Chapter

Series: ASM Technical Books
Publisher: ASM International
Published: 01 September 2022
DOI: 10.31399/asm.tb.dsktmse.t56050001
EISBN: 978-1-62708-432-1
... Characteristics of different types of diffusion treatments Type of nitriding Processing temperature Diffused case depth Case hardness, HRC Features °C °F Pack aluminizing 870–1050 1600–1920 25 μm–0.7 mm <20 Good for oxidation resistance, pack disposal issues Siliconizing (CVD) 925...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 March 2002
DOI: 10.31399/asm.tb.stg2.t61280287
EISBN: 978-1-62708-267-9
... laboratory tests must be verified by engine testing. Microscopic and macroscopic examination are important in revealing the extent of oxidation or hot corrosion damage. Visual appearance, enhanced by etching in some instances, is used to determine: Amount of coating lost (or remaining) Depth...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 August 2012
DOI: 10.31399/asm.tb.smfpa.t53500107
EISBN: 978-1-62708-317-1
... ( Ref 6.34 ). Duplex treatment of tools that involve plasma nitriding followed by PVD coating could reduce the required lubrication by 75% compared to conventional CVD and offer better antigalling and wear resistance properties ( Ref 6.34 ). Recent studies indicate that several amorphous hard carbon...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 October 2011
DOI: 10.31399/asm.tb.mnm2.t53060273
EISBN: 978-1-62708-261-7
..., and small amounts of vanadium are added to maintain fine grain size and thus enhance toughness. Group W tool steels are made with various nominal carbon contents (~0.60 to 1.40%); the most popular grades contain approximately 1.00% C. Group W steels have low resistance to softening at elevated temperatures...
Book Chapter

Series: ASM Technical Books
Publisher: ASM International
Published: 01 March 2001
DOI: 10.31399/asm.tb.secwr.t68350231
EISBN: 978-1-62708-315-7
... that peaks in the topography of the surface are dissolved preferentially. chemical vapor deposition (CVD). A coating process, similar to gas car- burizing and carbonitriding, whereby a reactant atmosphere gas is fed into a processing chamber where it decomposes at the surface of the workpiece, liberating one...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 March 2001
DOI: 10.31399/asm.tb.secwr.9781627083157
EISBN: 978-1-62708-315-7
Series: ASM Technical Books
Publisher: ASM International
Published: 01 August 1999
DOI: 10.31399/asm.tb.caaa.t67870179
EISBN: 978-1-62708-299-0
..., such as nickel and titanium, applied by chemical vapor deposition (CVD), physical vapor deposition (PVD), and electroplating methods also provide barrier protection; however, graphite/aluminum corrosion at coating flaw sites is much worse for these coatings than for an organic coating. This is due to the highly...
Series: ASM Technical Books
Publisher: ASM International
Published: 01 September 2022
DOI: 10.31399/asm.tb.dsktmse.9781627084321
EISBN: 978-1-62708-432-1