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optics
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Series: ASM Technical Books
Publisher: ASM International
Published: 01 November 2019
DOI: 10.31399/asm.tb.mfadr7.t91110153
EISBN: 978-1-62708-247-1
... to ceramic cavity devices, injection molded parts, and ball grid arrays. backside preparation ball grid arrays ceramic cavity devices injection molded parts milling optics polishing thinning This tutorial will assist the analyst in making decisions on backside thinning and polishing...
Abstract
The need for precise targeted interactive surgery on boards or modules is the main driver of backside preparation technology. This article assists the analyst in making decisions on backside thinning and polishing requirements. Thinning of the substrates can be accomplished by flat lapping, laser assisted chemical etch, plasma reactive ion etch, and CNC based milling and polishing. The article discusses the general characteristics, key principles, advantages, and disadvantages of these processes. It also contains case studies that illustrate the application of these processes to ceramic cavity devices, injection molded parts, and ball grid arrays.
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Published: 01 April 2013
Fig. 11 Specific lighting devices: (a and b) fiber optics, (c) microscope ring light, (d) microscope light, (e) ring flash, (f) microscope illuminator using fluorescent and ultraviolet tubes. Source: Ref 1
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Series: ASM Technical Books
Publisher: ASM International
Published: 01 November 2019
DOI: 10.31399/asm.tb.mfadr7.t91110042
EISBN: 978-1-62708-247-1
... Abstract Moore's Law has driven many degree circuit features below the resolving capability of optical microscopy. Yet the optical microscope remains a valuable tool in failure analysis. This article describes the physics governing resolution and useful techniques for extracting the small...
Abstract
Moore's Law has driven many degree circuit features below the resolving capability of optical microscopy. Yet the optical microscope remains a valuable tool in failure analysis. This article describes the physics governing resolution and useful techniques for extracting the small details. It begins with the basic microscope column and construction. The article discusses microscope adjustments, brightfield and darkfield illumination, and microscope concepts important to liquid crystal techniques. It also discusses solid immersion lenses, infrared and ultraviolet microscopy and concludes with laser microscopy techniques such as thermal induced voltage alteration and external induced voltage alteration.
Book Chapter
Series: ASM Technical Books
Publisher: ASM International
Published: 01 December 2003
DOI: 10.31399/asm.tb.cfap.t69780177
EISBN: 978-1-62708-281-5
... Abstract This article is a brief account of various factors pertinent to the characterization of materials and analysis of optical components, namely transmission, haze, yellowness, refractive index, surface irregularity, birefringence, internal contamination, surface gloss, and color...
Abstract
This article is a brief account of various factors pertinent to the characterization of materials and analysis of optical components, namely transmission, haze, yellowness, refractive index, surface irregularity, birefringence, internal contamination, surface gloss, and color. In addition, details on ad hoc tests used for determining the acceptability of a plastic part for its application are provided, along with typical examples.
Series: ASM Technical Books
Publisher: ASM International
Published: 01 November 2010
DOI: 10.31399/asm.tb.omfrc.t53030001
EISBN: 978-1-62708-349-2
... toughening. In addition, the chapter provides information on interlayer-toughened composites and honeycomb or foam structure composite materials. It also discusses the processes in optical microscopy of composite materials. References References 1. Halpin J.C. , The Role of the Polymeric...
Abstract
This chapter provides a general description of materials and methods for manufacturing high-performance composites. The materials covered are polymer matrices and prepreg materials and the methods include infusion processes, composite-toughening methods, matrix-toughening methods, and dispersed-phase toughening. In addition, the chapter provides information on interlayer-toughened composites and honeycomb or foam structure composite materials. It also discusses the processes in optical microscopy of composite materials.
Series: ASM Technical Books
Publisher: ASM International
Published: 01 November 2010
DOI: 10.31399/asm.tb.omfrc.9781627083492
EISBN: 978-1-62708-349-2
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in Silicon Device Backside De-Processing and Fault Isolation Techniques
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 3 An optical microscope image from a unit after the backside silicon etch process was completed. Silicon is removed from regions where the unit appears dark. The few remaining small bright spots are locations where silicon remains.
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in Silicon Device Backside De-Processing and Fault Isolation Techniques
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 7 Optical microscope images taken from a unit both before (left) and after (right) the dimpling process was performed. The contrast observed in these images is used to determine the endpoint for the dimpling process.
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in Silicon Device Backside De-Processing and Fault Isolation Techniques
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 10 Optical infrared emission image using 3.0 N.A. lens, CAD layout and electron beam image of the same devices from the backside of the chip
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in Delayering Techniques: Dry/Wet Etch Deprocessing and Mechanical Top-Down Polishing
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 14 Optical imaging of device FEOL from the substrate after backside delayering and etched
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Published: 01 November 2019
Figure 30 Optical photo of the STEM-in-SEM sample holder mounted to the SEM stage. The pole piece of the objective lens is visible above the sample holder.
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in Surface Analysis and Material Characterization Techniques Used in Semiconductor Industry to Identify and Prevent Failures
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 3 Optical images of typical QFP leads (left) and BGA sphere (right). The green squares indicate areas that were analyzed with AES surface and AES depth profiling.
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in Surface Analysis and Material Characterization Techniques Used in Semiconductor Industry to Identify and Prevent Failures
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 10 A) and B) Optical microscope images of good and failed device, respectively; C) and D) SEM image failed device showing short between two pins causing electrical failure.
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in Surface Analysis and Material Characterization Techniques Used in Semiconductor Industry to Identify and Prevent Failures
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 17 Example of particles. A. optical microscopy: stainless steel particle exposed after FIB. B. SEM-EDX mapping: Cl-containing organic particle in SiO2 filled molding compound exposed after polish/look.
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Published: 01 November 2019
Figure 5 (a) Low magnification optical image of the 3mm diameter membrane coated grid. The location of the sample is indicated by the arrow. (b) High magnification optical image of the TEM sample, placed on the membrane coated grid.
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in 2.5D and 3D Packaging Failure Analysis Techniques
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 17 (a) Optical image of the back of a flip-chip mounted die showing mechanical damage to corner (b) Infrared imaging shows that the damage extends to the front side circuitry
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in Failure Analysis Techniques and Methods for Microelectromechanical Systems (MEMS)[1]
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 18 Optical image of laterally stuck MEMS accelerometer
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Published: 01 November 2019
Figure 3 Different types of Ta-CAPS: (a) Optical image showing external construction of variety of surface mount and through hole Ta-CAPS. X-ray images show internal constructions of (b) regular surface mount, (c) face down and (d) multi anode Ta- CAPS.
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Published: 01 November 2019
Figure 14 Optical Image showing flex cracking in a cross sectioned MLCC.
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in Differentiating between EOS and ESD Failures for ICs[1]
> Microelectronics Failure Analysis: Desk Reference
Published: 01 November 2019
Figure 12 Optical photo showing location of the multiple data lines (horizontal) feeding into buffers below.
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