Search Results for coating deposition

Fig. 2 Nitride ceramic coatings deposited on cemented carbide substrates by physical vapor deposition. (a) TiN. (b) TiCN. (c) TiAlN More

Fig. 16-14 (Ti 1 , Al) coating deposited by triode ion plating at high substrate current density. Courtesy of A.S. Korhonen, Helsinki University of Technology More

Fig. 22.10 (Ti 33 Al 17 )N coating deposited by triode ion plating at low substrate current density. Scanning electron micrograph. Courtesy of A.S. Korhonen, Helsinki University of Technology. Source: Ref 22.40 , 22.41 More

Fig. 22.11 (T i ,Al)N coating deposited by triode ion plating at high substrate current density. Courtesy of A.S. Korhonen, Helsinki University of Technology. Source: Ref 22.40 , 22.41 More

Fig. 22.12 ZrN coating deposited by triode ion plating. Scanning electron micrograph. Courtesy of A.S. Korhonen, Helsinki University of Technology. Source: Ref 22.40 , 22.41 More

Fig. 22.13 (a) NbC coating deposited on a martensitic stainless steel by a salt bath process. (b) Chromium carbonitride coating deposited on nitrided AISI 1045 steel by a salt bath process. Light micrographs. Courtesy of T. Arai, Toyota Research Laboratories More

Fig. 12.4 Titanium nitride physical vapor deposition coating spall on a cemented carbide tool bit. Original magnification: 1000× More

Fig. 2.19 Attainable (a) deposition efficiencies (DE) and (b) tubular coating tensile (TCT) strengths for cold spraying copper in different powder size cuts as a function of the particle velocity excess with respect to critical velocity. Source: Ref 2.34 More

Figure 6.18: Porous coating produced by electrochemical deposition of Sn and Zn, followed by selective etching of the Zn. (a) Side view; (b) top view. Source: Arentoft, et al. [ 75 ]. More

Fig. 11.18 Induction systems for epitaxial deposition and CVD coating of semiconductors. From S. Berkman, V. S. Ban, and N. Goldsmith, Heteroepitaxial Semiconductors for Electronic Devices , G. W. Cullen and C. C. Wang, eds., Springer-Verlag, New York, 1978, p 264 ( Ref 2 ) More

Fig. 16.18 Effect of surface roughness ( R a ) on physical vapor deposition coating. Material is PM HSS, powder metallurgy high-speed steel. Source: Ref 16.6 More

Fig. 16.19 Flaking of physical vapor deposition coating on a D2 tool steel, due to residual stresses caused by surface features. Source: Ref 16.6 More

Fig. 16.20 Chemical vapor deposition coating applied to a stamping die for truck bumpers. Source: Ref 16.6 More

Fig. 22.20 Hardness of coatings for tool materials. PVD, physical vapor deposition; CVD, chemical vapor deposition More

Fig. 22.21 Physical vapor deposition coatings on cemented carbide substrates. (a) TiN. (b) TiCN. (c) TiAlN. Source: Ref 3 More

Fig. 7.127 Left, chemical vapor deposition (CVD)-coated aluminum extrusion dies. Right, demanding heat exchanger sections in AlMgSi0.5 produced with CVD–coated dies. Source: WEFA Singen Gmbh More

Fig. 6.23 A vacuum sputtering device used to deposit a thin coating of gold, or some other element, onto the surface of a SEM or EMPA specimen. Source: Polaron Instruments, Inc. More

Fig. 11.10 Hardness of various physical vapor deposition (PVD) coatings and chemical vapor deposition (CVD) coatings used for tooling materials. Source: Ref 11.9 More

Fig. 16.15 Applications of physical vapor deposition (PVD) coatings. (a) PVD TiN used for soda can tab punch. (b) PVD TiCN used for AA battery casing extrusion punch. Source: Ref 16.55 More

Fig. 20.24 Physical vapor deposition coated silicon carbide monofilament. Source: Ref 8 More