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1-4 of 4
Yunfei Wang
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Proceedings Papers
ISTFA2024, ISTFA 2024: Conference Proceedings from the 50th International Symposium for Testing and Failure Analysis, 519-522, October 28–November 1, 2024,
Abstract
View Papertitled, E-beam Probing and E-beam-Assisted Device Alteration (EADA) for Fault Isolation in PowerVia and Advanced Technology Nodes
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for content titled, E-beam Probing and E-beam-Assisted Device Alteration (EADA) for Fault Isolation in PowerVia and Advanced Technology Nodes
This paper demonstrates that e-beam assisted device alteration (EADA) is a powerful, high-resolution technique for fault isolation debug for advanced technology nodes. A case study using this technique is reviewed and shows successful isolation of a defective single inverter. In addition, fundamental studies of ring oscillator behavior and device perturbations with e-beam exposure found clear correlations for electron beam exposure with NMOS/PMOS device parameters. Electron-hole pair generation in the device with beam exposure is likely the main component for the perturbation, but there may be other contributing factors including charging effects and/or heating.
Proceedings Papers
ISTFA2023, ISTFA 2023: Conference Proceedings from the 49th International Symposium for Testing and Failure Analysis, 420-426, November 12–16, 2023,
Abstract
View Papertitled, Nanoprobing for Logical Cell Operational Tests
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for content titled, Nanoprobing for Logical Cell Operational Tests
We have identified a method for nanoprobing CMOS circuits at MHz frequencies using the same hardware already used for single transistor pulsing applications. In this paper we show example responses and failure isolation examples for both sequential and combinational logic cells and discuss the test setup and sample prep that were used to successfully collect the responses.
Proceedings Papers
ISTFA2021, ISTFA 2021: Conference Proceedings from the 47th International Symposium for Testing and Failure Analysis, 241-247, October 31–November 4, 2021,
Abstract
View Papertitled, Resistive Open Defect Isolation in Nano-Probing
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for content titled, Resistive Open Defect Isolation in Nano-Probing
This paper presents a number of case studies in which various methods and tools are used to localize resistive open defects, including two-terminal IV, two-terminal electron-beam absorbed current (EBAC), electron beam induced resistance change (EBIRCH), pulsed IV, capacitance-voltage (CV) measurements, and scanning capacitance microscopy (SCM). It also reviews the advantages and limitations of each technique.
Series: ASM Technical Books
Publisher: ASM International
Published: 01 November 2019
DOI: 10.31399/asm.tb.mfadr7.t91110323
EISBN: 978-1-62708-247-1
Abstract
This article presents methods that enable one to consistently, uniformly and quickly remove substrate silicon from units without imparting damage to the structure of interest. It provides examples of electron beam probing and backside nano-probing techniques. The electron beam probing techniques are E-beam Logic State Imaging, Electron-beam Signal Image Mapping, and E-beam Device Perturbation. Backside nano-probing techniques discussed include: Electron Beam Absorbed Current, Electron Beam Induced Resistance Change, four terminal resistance measurements, resistive gate defect identification, and circuit editing. The article also presents methods to prepare electron beam probing samples where some remaining silicon is required for the transistor functions and transmission electron microscope samples from units where the substrate silicon has been partially or completely removed.
