In this paper, we discuss the use of spontaneous photon emission microscopy (PEM) for observing filaments formed in HfO 2 resistive random access memory (ReRAM) cells. The setup employs a CCD and an InGaAs camera, revealing photon emissions in both forward ( set ) and reverse ( reset ) bias conditions. Photon emission intensity is modeled using an electric-field equation and inter-filament distance and density are determined assuming a uniform spatial distribution. The paper also discusses the use of high frame rate and prolonged photon emission measurements to assess lifetime and reliability and explains how single filament fluctuations and multiple filaments in a single cell were observed for the first time.

Yttria-stabilized zirconia coatings were deposited onto a Ti-6Al-4V substrate through a microplasma spray technique and incubated in simulated body fluid (SBF) for different periods of time (3, 7, 14, 28 days). The formation of apatite on the surface was investigated to evaluate the bioactivity of the coatings. Surface morphologies and structural changes in the coatings before and after immersion were analyzed by optical microscopy, scanning electron microscopy, and x-ray diffractometry. The calcium (Ca 2+ ) concentration in the solutions was measured directly after the samples were removed, using an inductively coupled plasma atomic emission spectrometer (ICP). The results showed that yttria-stabilized zirconia coatings can be produced by microplasma spraying and, even though the coatings contain few small unmelted particles, apatite can be formed on the coatings that are soaked in SBF solution. These results indicate that the yttria-stabilized zirconia coatings exhibited definite bioactivity.

The mechanical behavior of single splats on substrates can provide insight into a number of critical coating aspects, including stress evolution, inelastic behavior, and adhesion. Single splat studies provide a theoretically sound base for the understanding of properties, as they are essentially thin film structures on substrates – a geometrically simple arrangement. However, the experimental measurement of splat properties is non-trivial. Previous work has shown that residual stresses and hardness of splats can be measured successfully using X-ray diffraction and nano-indentation, respectively. Here we present the development of a new technique for the determination of in-plane splat properties, including modulus and flow stress, as well as splat-substrate adhesion. This method is based on the widely-used substrate curvature technique, and adaptations of the Stoney formula for electronic thin films. Critical aspects of the continuum-based analysis, including the effects of splat geometry and/or partial debonding, are discussed.