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Vikas Dixit
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Proceedings Papers
ISTFA2022, ISTFA 2022: Conference Proceedings from the 48th International Symposium for Testing and Failure Analysis, 190-195, October 30–November 3, 2022,
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Moore’s law has been a major driving force in the development of novel semiconductor devices and has continued to hold its relevance over the years. The resultant, smaller and more powerful, microprocessors not only cater to the ever-increasing demands of the existing needs but also are important enablers of novel applications and discoveries in different areas. Several critical features of these latest devices are in the atomic to nanometer scale, which has enhanced the necessity of a largescale transmission electron microscopy (TEM) imaging-based metrology and failure analysis for their process development. As a result, the automation of lamella preparation using focused ion beam (FIB) and TEM imaging has gathered an enormous momentum in last few years. A key aspect of automating a large-scale TEM sample preparation not only involves the calibration of a given FIB tool to achieve an acceptable and repeatable quality of TEM samples but also to ensure that sample quality is consistent across the entire fleet of toolsets. In this work, the performance of three ThermoFisher Exsolve toolsets using a common tool calibration method for both, lamella thickness and targeting, has been compared. It was found that in general, thickness of TEM lamella showed a larger variation as compared to targeting over the period of one month. Lamella thickness showed a decreasing trend, and it entailed a need of recalibrating the tools in an interval of two weeks so that the variation in both thickness and targeting for the fleet can be kept within the desired specifications of ±3 nm (2σ).
Proceedings Papers
ISTFA2021, ISTFA 2021: Conference Proceedings from the 47th International Symposium for Testing and Failure Analysis, 130-134, October 31–November 4, 2021,
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The automation of TEM imaging and lamella preparation using focused ion beam (FIB) technology has gained significant momentum, particularly in the development of microprocessors. A key requirement of automating TEM sample preparation is ensuring consistent thickness control and accurate targeting of features of interest in the ultra-thin lamella. This work examines the factors that impact both metrics. It explains how FIB pattern calibration requires milling to be divided into steps to minimize the effects of drift, how the height of the protective cap on the ion-beam tip influences sample thickness, and how FIB aperture erosion has little impact on lamella thickness until it reaches a certain point where the lamella profile cannot be reliably maintained. It was also found that the tail of the ion beam remains invariant during aperture degradation in the operable range and that it plays a prominent role in determining the cross-sectional thickness of the TEM lamella.