Thermal issues management is a daily design challenge for teams working with analog mixed-signal technologies such as “SmartMOS”, with the integration of analog circuitry, high power density devices and logic control. A case study based on an NXP new product introduction will illustrate the use of Thermography as a complementary technique to standard Design debug activities, leading to the demonstration of a thermal crosstalk phenomenon in the analyzed analog mixed signal device. Based on InfraRed Thermography principle and specific Trigger Delay and Thermal Mapping modes, a transient thermal event was fully characterized, in addition to more common techniques such as Design and Layout study, electrical characterization, simulation, Microprobing, and Thermal Laser Stimulation. The added value of the thermography, as well as the limitations of the technique, will be discussed in that paper.

The presence of crystalline defects, including dislocations and pipeline defect, is detrimental to both the processing and the intrinsic quality of semiconductor devices. The electrical parametric or functional failures generated by those defects require accurate identification and proper classification in a continuous improvement mindset. Depending on the failure analyst choice of the investigation technique, the distinction between a dislocation and a pipeline defect can be difficult. In this paper, based on case studies of mixed-mode devices, the various electrical and physical FA investigation techniques are explored and compared. From an electrical investigation standpoint, fault localization techniques will be reviewed (Thermal Laser Stimulation and Photon Emission Microscopy) as well as the direct electrical measurements means (external measurement and nanoprobing AFP). From a physical analysis standpoint, the use of various methods after deprocessing will be considered: top down delineation etch, Atomic Force Microscopy (AFM), Scanning Microwave Microscopy (SMM), and Transmission Electron Microscopy (TEM). The position of the defect as well as its physical signature observed through the various methods will determine its proper classification and will determine the appropriate corrective actions. The paper will be concluded with a discussion on the physical differences between a dislocation and a pipeline defect, as well as insights into the wafer fab manufacturing process.