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P. Alpern
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Proceedings Papers
Root Cause Finding of a Diode Leakage Failure Using Scanning Magnetic Microscopy and ToF-SIMS as Key Methods
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ISTFA2006, ISTFA 2006: Conference Proceedings from the 32nd International Symposium for Testing and Failure Analysis, 132-136, November 12–16, 2006,
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View Papertitled, Root Cause Finding of a Diode Leakage Failure Using Scanning Magnetic Microscopy and ToF-SIMS as Key Methods
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for content titled, Root Cause Finding of a Diode Leakage Failure Using Scanning Magnetic Microscopy and ToF-SIMS as Key Methods
One challenge in failure analysis of microelectronic devices is the localization and root cause finding of leakage currents in passives. In this case study we present a successful approach for failure analysis of a diode leakage failure. An analytical flow will be introduced, which contains standard techniques as well as SQUID (superconducting quantum interference device) scanning magnetic microscopy and ToFSIMS as key methods for localization and root cause identification. [1]