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Martin Kuball
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Proceedings Papers
ISTFA2023, ISTFA 2023: Conference Proceedings from the 49th International Symposium for Testing and Failure Analysis, 509-518, November 12–16, 2023,
Abstract
View Papertitled, In-Situ Junction Analysis in SiC (and GaN)
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for content titled, In-Situ Junction Analysis in SiC (and GaN)
A commercially available 4H-SiC power device and a GaN on SiC HEMT were examined with Ga-FIB sectioning and various junction analysis techniques. The impact of Ga-FIB on the electronic properties of such power devices is observed to be less significant than anticipated. A field of view was FIB-milled into the structure, exposing a row of devices. In this window, p/n junctions were evaluated by Passive Voltage Contrast (PVC), Electron Beam Induced Current (EBIC), and Kelvin Force Probe Microscopy (KFPM). Results showed excellent fidelity to expectations and each technique brought out new insights. In further work, the gate voltage was varied and the changing of depletion zones upon device turn-on was observed. This work: 1) Demonstrates complete sufficiency of Ga-FIB cross sections for regular cross-sectional work. 2) Demonstrates a novel method for investigating junction properties from Ga-FIB sections of power devices which largely leaves the rest of the device intact. 3) Provides some assurance that the Ga-FIB does not severely impact the evaluation of junction properties in some power semiconductors. 4) Points to alternative mechanism for device turn-on.
Proceedings Papers
ISTFA2007, ISTFA 2007: Conference Proceedings from the 33rd International Symposium for Testing and Failure Analysis, 1-5, November 4–8, 2007,
Abstract
View Papertitled, Integrated Raman – IR Thermography for Reliability and Performance Optimization and Failure Analysis of Electronic Devices
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for content titled, Integrated Raman – IR Thermography for Reliability and Performance Optimization and Failure Analysis of Electronic Devices
We report on the development of a novel thermography technique, integrated Raman – IR thermography, illustrated here on AlGaN/GaN electronic devices. As it is a generic technique future application to Si, GaAs and other devices is anticipated. While IR thermography can provide fast temperature overviews, its current use for many of today’s technologies is complicated by the fact that it does not provide the spatial resolution needed to probe sub-micron/micron size active device areas. Integrating IR with micro-Raman thermography, providing temperature information with ~0.5 µm spatial resolution, enables unique thermal analysis of semiconductor devices to a level not possible before. This opens new opportunities for device performance and reliability optimization, and failure analysis of modern semiconductor technology, in research, development, and quality control / manufacturing environments.