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D. Carisetti
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Proceedings Papers
Infrared and Visible—Near Infrared Electroluminescence Developments for FA in AlGaN/GaN HEMTS on SiC
ISTFA2010, ISTFA 2010: Conference Proceedings from the 36th International Symposium for Testing and Failure Analysis, 393-397, November 14–18, 2010,
Abstract
View Papertitled, Infrared and Visible—Near Infrared Electroluminescence Developments for FA in AlGaN/GaN HEMTS on SiC
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for content titled, Infrared and Visible—Near Infrared Electroluminescence Developments for FA in AlGaN/GaN HEMTS on SiC
HEMT (High Electron Mobility Transistor) are playing a key role for power and RF low noise applications. They are crucial components for the development of base stations in the telecommunications networks and for civil, defense and space radar applications. As well as the improvement of the MMIC performances, the localization of the defects and the failure analysis of these devices are very challenging. To face these challenges, we have developed a complete approach, without degrading the component, based on front side failure analysis by standard (Visible-NIR) and Infrared (range of wavelength: 3-5 µm) electroluminescence techniques. Its complementarities and efficiency have been demonstrated through two case studies.
Proceedings Papers
ISTFA2009, ISTFA 2009: Conference Proceedings from the 35th International Symposium for Testing and Failure Analysis, 283-288, November 15–19, 2009,
Abstract
View Papertitled, UV Emission Microscopy Development for High Band Gap Components
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for content titled, UV Emission Microscopy Development for High Band Gap Components
HEMT (High Electron Mobility Transistor) are playing a key role for power and RF low noise applications. As well as the improvement of the MMIC performances, the localization of the defects linked with hot electron and the failure analysis of these devices are very challenging. To face these challenges, we have developed a complete approach, without degrading the component, based on front side failure analysis by UV electroluminescence or UV light emission. Its feasibility and efficiency have been demonstrated through two case studies. So, a specific UV microscopy technique has been developed and is presented in this paper.
Proceedings Papers
ISTFA2008, ISTFA 2008: Conference Proceedings from the 34th International Symposium for Testing and Failure Analysis, 214-219, November 2–6, 2008,
Abstract
View Papertitled, Backside Failure Analysis by Electroluminescence on Microwave Devices
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for content titled, Backside Failure Analysis by Electroluminescence on Microwave Devices
III-V HBT (Heterojunction Bipolar Transistor) and HEMT (High Electron Mobility Transistor) are playing a key role for power and RF low noise applications. As well as the improvement of the MMIC performances, the localization of the defects and the failure analysis of these devices are very challenging. Active area thickness is only few nanometers, backside failure localization is mandatory because of thermal drain or metal bridge covering the front side, materials involved might be of ultimate hardness and/or high chemical sensitivity while failure mechanisms strongly differ from Si technology ones. To face these challenges, we have developed a complete approach, without degrading the component, based on backside failure analysis by electroluminescence. Its efficiency and completeness have been demonstrated through case studies.