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Proceedings Papers

The Study and Methodology of Defects Isolation For Contacts of Non-Isolated Active Region on New Logic Designs

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C. H. Wang, C. M. Shen, C. J. Lin, Z. H. Lee, J. H. Chou
ISTFA2005, ISTFA 2005: Conference Proceedings from the 31st International Symposium for Testing and Failure Analysis, 479-483, November 6–10, 2005,
https://doi.org/10.31399/asm.cp.istfa2005p0479
Abstract
With the advancement in technology and lower operating voltage, new standards have evolved in circuit layout and design. Some of these new standards have increased the difficulties of the physical failure analysis process, especially on the front-end. The phenomenon described in this paper is the unusual voltage contrast (VC) and conductive atomic force microscope (C-AFM) curve on a non-isolated active region. The model and mechanism are demonstrated for front-end failure analysis. Based on this, the solution for analysis is investigated.
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