Skip Nav Destination
Close Modal
Update search
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
Filter
- Title
- Authors
- Author Affiliations
- Full Text
- Abstract
- Keywords
- DOI
- ISBN
- EISBN
- Issue
- ISSN
- EISSN
- Volume
- References
NARROW
Format
Topics
Subjects
Article Type
Volume Subject Area
Date
Availability
1-1 of 1
E. Tormey
Close
Follow your search
Access your saved searches in your account
Would you like to receive an alert when new items match your search?
Sort by
Proceedings Papers
ITSC2000, Thermal Spray 2000: Proceedings from the International Thermal Spray Conference, 495-500, May 8–11, 2000,
Abstract
PDF
BaTiO3 has been successfully sprayed by HVOF to produce dense 25-150 µm thick deposits for use as dielectric and capacitive layers within prototype multilayer conformal electronics. Parameter optimization has been shown to play a critical role in the effective spraying of these materials as thin structurally homogeneous deposits. The affect of standoff distance and combustion chamber size on the phase structure of the coatings have been studied and related to the dielectric properties of the layer. The proportion of crystalline to amorphous phase was found to be critically dependent upon the degree of melting of the particles in the flame and the rate of cooling of the deposits. The crystalline/amorphous ratio is directly related to the dielectric properties of the layer with greater crystallinity giving higher values of dielectric constant. Microcracks and splat/splat interfaces are also believed to adversely affect the dielectric properties. The maximum dielectric constant (K) values achieved using the HVOF method for deposition have been in the range 70-115.