In this paper a process based on both Thermal Plasma Chemical Vapor Deposition (TPCVD) and Suspension Plasma Spraying (SPS) is applied on r.f. induction thermal plasma for α/β-SiC ceramic synthesis and deposition. The starting materials are low-cost liquid disilanes. The resulting coatings are investigated by means of SEM and XRD. Results on the influence of the processing parameters (i.e. pressure, spray distance, substrate temperature, plasma gas nature and composition, precursor composition, atomization parameters) on the coating phase and microstructure are shown. Control of the microstructure (or nanostructure) as well as of the phase content, namely the ratio α/β can be achieved. A processing route presenting the elementary steps of SiC TPCVD is also proposed.

This content is only available as a PDF.
You do not currently have access to this content.