This paper discusses the history of the low-pressure plasma spraying (LPPS) process and some of the developments that led to its use as a thin film deposition technique. It also discusses the advantages of the process and its potential for further improvement and additional applications.

deposition rate, electron beam physical vapor deposition, low pressure plasma spraying, thin film coating process
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Copyright © 2009 ASM International. All rights reserved.
2009
ASM International
Topics
Physical vapor deposition Plasma spray coating
Issue Section:
Plasma Spraying
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