Abstract
Solution precursor plasma spraying has been used to deposit ceramic coatings with submicron/nanocrystalline structures. Previous studies revealed that the deposition mechanism in the solution precursor plasma spraying differs from that in the conventional plasma spraying. To increase the understanding of the deposition mechanism in the solution precursor plasma spraying, a numerical model is used to predict the particle conditions on the substrate. Five types of particle conditions, melted particles; small sintered particles; dry agglomerates; wet agglomerates; and wet droplet are assumed based on the computed temperature distribution of the particles. An analysis of the deposition mechanism in the solution precursor plasma spraying is performed. Experiment results s are also collected to verify the numerical prediction and the analysis of the deposition mechanisms.
