Low pressure plasma spraying (LPPS) and LPPS-Thin Film (LPPS-TF) processes cover a broad operational pressure range from typically 200 mbar down to a few millibars, filling the gap between conventional thermal spray processes, where coatings are made from the liquid phase, and conventional thin film technologies such as PVD or CVD, where coatings are produced from precursors species in the vapor phase. Using some specific parameters of the LPPS-TF process, the injected material can be partially or even completely in gaseous phase, disqualifying diagnostics based on the detection of solid or liquid particles such as the DPV-2000 (Tecnar, St-Bruno, QC, CA). In this case, other optical diagnostic tools have to be used, such as optical emission spectroscopy (OES) to characterize the LPPS-TF process. In this paper, a qualitative study of the properties of the injected material in the plasma jet using DPV-2000 and optical emission spectroscopy is presented by varying specific plasma parameters. Moreover, in some particular cases, it is shown that the combination of DPV measurements and OES can help to monitor the coating process and to improve the basic understanding of the LPPSTF technology.

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