Abstract
With the new development of the LPPS Thin-Film technology (LPPS-TF), which is a special modification of conventional LPPS using reduced chamber pressures below 10 mbar, a new window has been opened to deposit uniform and dense thin layers onto large areas in short coating times. This spray process will allow the access to new market areas and will be able to bridge the gap between conventional thin film (< 1 - 10 µm) deposition using PVD/CVD processes and thick (> 50 - 200 µm) thermally sprayed layers. This paper presents the status of the LPPS-Thin Film technology as a hybrid coating process between thermal spray and vapor deposition and gives an overview of potential applications for functional thin coatings and large area coverage.
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Copyright © 2007 ASM International. All rights reserved.
2007
ASM International
Issue Section:
Plasma Spraying
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