HVOF-sprayed alumina appears to be well suited for applications in semiconductor devices. This paper investigates the influence of HVOF spraying parameters on the electrical properties of alumina layers. Diagnostic tests show that small changes in gas ratios and flow rates can significantly alter particle and splat characteristics as well as the dielectric breakdown strength of the coatings. A large number of parameters are changed in order to assess the extent to which electrical properties can be controlled. Paper includes a German-language abstract.