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hafnium(IV) oxide

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Proceedings Papers

ISTFA2021, ISTFA 2021: Conference Proceedings from the 47th International Symposium for Testing and Failure Analysis, 115-121, October 31–November 4, 2021,
... model [18]. Experiment description In this section we discuss the device under test and the experiment setup used in our measurements. Fig. 1 shows that the ReRAM samples consist of a 4 nm thick HfO2 , deposited by Atomic Layer Deposition (ALD) at 250 °C using cycles of tetrakis(dimethylamido)hafnium...