The development of modern power semiconductors requires the reduction of the resistance in the on-state of the device. One way to accomplish this is to reduce the bulk silicon thickness. To reach low final Si thicknesses, the grinding processes have to be adapted and optimized and new process-flows, such as dicing before grinding (DBG), must be employed.

Several failures in Chip-On-Lead (COL) package from the customer were returned for Failure Analysis (FA). Containment activities were able to find similar failures. The connectivity of the silicon die to the leads uses gold wire. The die is in live bug position with respect to the package and is being held in place using non-conductive die attach epoxy. The identification of the Failure Mechanism (FMECH) utilized analysis flow involving non-destructive and destructive FA techniques. A hairline crack was found on the die between the two (2) corner pins. Based on lot history reviews, hairline die crack had a very low detectability at electrical test. Further collaboration with the process owners showed the need to identify the crack initiation, propagation and the factors that could result to this FMECH. Analysis of fracture or fractography was utilized in identifying the crack initiation point and propagation. Due to low detectability, identifying the factors resulting to die crack would require several evaluations and process mappings. Finite element analysis (FEA) was utilized to create models and simulation to identify factors that would result to highly stressed area identified through fractography. These additional data for the hairline crack were vital on the identification of root cause and formulation of corrective/preventive actions.

Some of the most challenging task in analyzing fractures is a die that has not been fully cracked apart and a cracked die with electrical overstress damage. Traditional tools such as simple magnifying lens, optical microscope and up to the advance Scanning Electron Microscope are not enough to study the internal fractures or markings that could lead back to the origin of the crack. In order to study these internal fractures, the analyst tends to break the sample into pieces. However, this method creates additional mechanical stress and leads to a secondary crack where the point of origin will be difficult to analyze. This paper aims to introduce infrared microscopy in fractography (mainly on silicon) using cases and techniques to minimize the occurrence of secondary crack in analyzing internal fractures.

A land-grid array connector, electrically connecting an array of plated contact pads on a ceramic substrate chip carrier to plated contact pads on a printed circuit board (PCB), failed in a year after assembly due to time-delayed fracture of multiple C-shaped spring connectors. The land-grid-array connectors analyzed had arrays of connectors consisting of gold on nickel plated Be-Cu C-shaped springs in compression that made electrical connections between the pads on the ceramic substrates and the PCBs. Metallography, fractography and surface analyses revealed the root cause of the C-spring connector fracture to be plating solutions trapped in deep grain boundary grooves etched into the C-spring connectors during the pre-plating cleaning operation. The stress necessary for the stress corrosion cracking mechanism was provided by the C-spring connectors, in the land-grid array, being compressed between the ceramic substrate and the printed circuit board.

This paper demonstrates the application of fractography on ductile fracture in gold wire bonding and brittle fracture in micro lateral crack of silicon chip. Different separation mode of a lifted wire ball was mapped through the study of various sizes of dimples, ductile zone and non-welded area. Multiple Focus Ion Beam (FIB) cuts were required at lateral crack area in order to expose the horizontal fracture features to determine the crack propagation direction.

A PCB trace was repeatedly cracking in the same location. Visual inspection showed cracking there and at structurally similar locations, with solder mask missing from one side of the trace of interest. Fracture analysis suggested that these issues and etch pitting caused crack initiation, followed by fatigue failure that ultimately led to full fracture. A FIB section of a second failure reinforced the finding that the fundamental cracking mechanism was fatigue.

During package qualification, a 5-die-stacked chip scale package was being marginally triggered on high stand-by current collectively known as Power ICCS failure. Affected lots are subjected to 3x reflow at 240°C. Post reflow failures include blown_up, high standby current in Vcc pin (ISBLO), and high standby current in Vccq pin (ISBLOQ). Backside chip-outs are observed on Die 1 and Die 3 of the three failures. Electrical validation showed that only Die 3 is failing. Corner crack on Die 3 is common to the blown_up and ISBLO failing units while crack on Die 3 backside is observed to propagate toward the active area on ISBLOQ failing units. Fracture analysis results show that the crack of the three failures all originated from die backside chip-out. Thermo-mechanical model of the package shows that, by design, Die 3 generates the highest stress concentration. Results show that if chip-outs are present on the area of the die with the highest stress concentration and the unit is subjected to reflow temperature of 240°C, die crack will propagate from the chip-out. This paper presents the unique failure mechanism observed on a 5-die-stacked chip scale package and the corrective actions applied to solve the issue.