In most of the non-destructive electrical fault isolation cases, techniques such as DLS, Photon Emission, LIT, OBIRCH indicate a fault location directly. But relying on just one of these techniques for marginal failure mechanism is not enough for better fault localization. When Failure Analysis (FA) engineers encounter high NDF (No Defect Found) rates, by using only one of the techniques, they may need to consider the relationship between the responded locations by different techniques and fail phenomenon for better defect isolation. This paper talks about how a responded DLS location does not always indicate a fault location and how LVP data collected using DLS location can pin point the real defect location.