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A. J. Huber
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Proceedings Papers
ISTFA2010, ISTFA 2010: Conference Proceedings from the 36th International Symposium for Testing and Failure Analysis, 20-26, November 14–18, 2010,
Abstract
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Abstract We use ultra-resolving terahertz (THz) near-field microscopy based on THz scattering at atomic force microscope tips to analyze 65-nm technology node transistors. Nanoscale resolution is achieved by THz field confinement at the very tip apex to within 30 nm. Images of semiconductor transistors provide evidence of 40 nm (λ/3000) spatial resolution at 2.54 THz (wavelength λ = 118µm) and demonstrate the simultaneous THz recognition of materials and mobile carriers in a single nanodevice. The mobile carrier contrast can be clearly related to near-field excitation of THz-plasmons in the semiconductor regions. The extraordinary high sensitivity of our microscope provides THz near-field contrasts from less then 100 mobile electrons in the probed volume.