Advanced nanoscale material characterization requires high lateral resolution and sensitivity. This paper presents a novel analytical system that integrates a liquid metal alloy ion source (LMAIS), magnetic sector secondary ion mass spectrometry (SIMS), and laser interferometer stage with focused ion beam (FIB) technology. This integration enables high-resolution 2D/3D structural visualization and precise surface analysis at the nanoscale. We demonstrate the system's enhanced capabilities in microelectronics applications, where it achieves unprecedented spatial resolution and analytical sensitivity. Our results show how this advanced nano-analysis platform expands the boundaries of materials science and semiconductor technology characterization.

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