A new scanning capacitance microscope, with an optimized, modern RF circuitry is described. The new design results in improved ease of use and sensitivity. We will discuss the design details and show application examples on semiconductor devices and ferroelectric materials.

failure analysis, ferroelectric materials, RF circuitry, scanning capacitance microscope, semiconductor devices
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2022
ASM International
Topics
Semiconductor wafer fabrication
Issue Section:
Scanning Probe Analysis
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