This paper describes the new Cameca Akonis secondary ion mass spectrometry (SIMS) tool, which was developed to fill a critical gap in semiconductor fabrication processes by providing high throughput, high precision detection for implant profiles, composition analysis, and interfacial data directly in the semiconductor manufacturing line. The system enables automation in the primary ion column to ensure repeatability across tools for fabrication-level process control and tool-to-tool matching.

composition analysis, process control, secondary ion mass spectrometry, semiconductor fabrication
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2022
ASM International
Topics
Semiconductor wafer fabrication Secondary ion mass spectrometry
Issue Section:
Poster Session
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