This presentation is a pictorial guide to the selection and application of measurement methods for defect localization. The presentation covers electron beam absorbed current (EBAC), electron beam induced current (EBIC), passive voltage contrast (PVC), optical and electron beam induced resistance change methods (OBIRCH and EBIRCH), lock-in thermography, photon emission microscopy (PEM), and nanoprobing. It describes how the measurements are made, the sensing mechanisms involved, and the output that can be expected.

defect localization, electron beam absorbed current, electron beam induced current, optical beam induced resistance change, passive voltage contrast, photon emission microscopy
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2021
ASM International
Topics
Photoemission electron microscopy Atomic force microscopy Semiconductor wafer fabrication Thermoelectric effect Thermography Scanning electron microscopes
Issue Section:
Fault Isolation
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