Abstract
The characterization of back side illumination (BSI) image sensors is challenging because of the unique construction of such sensors with silicon on top. A novel method for BSI image sensor characterization is presented in this paper. The proposed approach is based on backside circuit editing using ion beam and optical imaging techniques. This provides access to buried conductors and creates probe points for measurements that can be made using an optical, electron beam, or mechanical micro/nano prober.
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2021
ASM International
Issue Section:
FIB Circuit Analysis and Edit
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