In this work, two analysis methods for word line (WL) defect localization in NAND flash memory array are presented. One is to use the Emission Microscope (EMMI) and Optical Beam Induced Resistance Change (OBIRCH) to analyze the device through backside, which has no risk of damage during sample preparation. Depending on the I-V characteristics of defects, different analysis tools can be applied. The second method is to analyze a device defect location that is hard to detect through backside analysis. The precise defect site can be localized by Electron Beam Induce Resistance Change (EBIRCH) [1,2], and the defect profile can be observed. The large memory array in NAND flash structure leads to the wide sample movement during EBIRCH analysis. The sub-stage movement function used successfully solves this problem.

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