Nanoprobing systems have evolved to meet the challenges from recent innovations in the semiconductor manufacturing process. This is demonstrated through an exhibition of standard SRAM measurements on TSMC 7 nm FinFET technology. SEM based nanoprober is shown to meet or exceed the requirements for measuring 7nm technology and beyond. This paper discusses in detail of the best-known methods for nanoprobing on 7nm technology.

7nm technology, fin field-effect transistor, nanoprobing systems, scanning electron microscopy, semiconductor manufacturing process, static random access memory
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Copyright © 2019 ASM International. All rights reserved.
2019
ASM International
Topics
Scanning electron microscopy Semiconductor wafer fabrication
Issue Section:
Nanoprobing and Electrical Characterization
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