Abstract
Dopants imaging using scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy are used for identifying doped areas within a device, the latter being analyzed either in a top view or in a side view. This paper presents a sample preparation workflow based on focused ion beam (FIB) use. A discussion is then conducted to assess advantages of the method and factors to monitor vigilantly. Dealing with FIB machining, any sample preparation geometry can be achieved, as it is for transmission electron microscopy (TEM) sample preparation: cross-section, planar, or inverted TEM preparation. This may pave the way to novel SCM imaging opportunities. As FIB milling generates a parasitic gallium implanted layer, a mechanical polishing step is needed to clean the specimen prior to SCM imaging. Efforts can be conducted to reduce the thickness of this layer, by reducing the acceleration voltage of the incident gallium ions, to ease sample cleaning.
