Using a compact nanoprobing setup comprising eight probe tips attached to piezo-driven micromanipulators, various techniques for fault isolation are performed on 28 nm samples inside an SEM. The recently implemented Current Imaging technique is used to quickly image large arrays of contacts providing a means of locating faults.

electron beam absorbed current, electron beam induced current, failure analysis, fault isolation, nanoprobing, piezo-driven micromanipulators, scanning electron microscope
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Copyright © 2016 ASM International. All rights reserved.
2016
ASM International
Topics
Scanning electron microscopy Semiconductor wafer fabrication Test method evaluation
Issue Section:
Scanning Probe Analysis
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