Near-Infrared Photon Emission Spectroscopy Trends in Scaled SOI Technologies

In this paper, near-infrared photon emission spectroscopy measurements from ring oscillators in 45 nm and 32 nm SOI process technology are compared. Employing a cryogenically cooled camera, the measurements cover a broad spectral range from 1200-2200 nm. Both leakage and switching emission, increase monotonically with the wavelength, suggesting measurements should be made at longer wavelengths than has historically been practiced. The paper discusses the optimum cut-off wavelength for maximum signal-to-noise ratio and the obvious importance of reduced ambient temperature for performing measurements.