Nanomachining capability scaling both in the areas of machining precision and novel gas chemistries are required for focused ion beam technology to keep pace with process technology advancement. In this paper, we review the nanomachining potential for the Helium Ion Microscope (HIM) and the Neon Ion Microscope (NIM). The paper also includes an in depth analysis of NIM imaging resolution, subsurface material interaction, and nanomachining performance.

helium ion microscope, imaging resolution, nanomachining, neon ion microscope, performance characteristics
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Copyright © 2011 ASM International. All rights reserved.
2011
ASM International
Topics
Ion microscopy Semiconductor wafer fabrication
Issue Section:
Circuit Edit
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