We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.

deformable mirror, failure analysis, solid immersion microscopy, spherical aberrations, substrate wafer thickness
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Copyright © 2011 ASM International. All rights reserved.
2011
ASM International
Topics
Microscopy Semiconductor wafer fabrication
Issue Section:
Advanced Techniques
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