Abstract

In this paper, we describe a modified soft defect localization (SDL) technique, PSDL (pseudo-soft defect localization), to localize pseudo-soft defects in integrated circuits (ICs). Similar to soft defects, functional failures due to pseudo-soft defects are sensitive to operating parameters (such as voltages, frequencies and temperatures) and/or laser exposures. Pass/fail states in pseudo soft defect failures are, however, not fully reversible after laser exposure or after changing operating parameters. PSDL uses the methodology of conventional SDL and/or TIVA in combination with a new scanning scheme for defect localization. An example will be shown to demonstrate the use of this technique to localize pseudo-soft defects.

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