In this paper, the application of scanning near-field photon emission microscopy for imaging photon emission sites is demonstrated. Photon emissions generated by a Fin-FET test structure with one metallization layer are imaged with spatial resolution of 50 nm using scattering dialectic probe. The potential applications and limitations of the technique are discussed.

failure analysis, FinFET, metallization, near-field photon emission microscopy
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Copyright © 2008 ASM International. All rights reserved.
2008
ASM International
Topics
Photoemission electron microscopy Metallization
Issue Section:
Advanced Techniques
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