The Failure Site Localization Using Absorbed Current Image and Voltage Distribution Contrast

This paper describes the detection range of two failure site localization methods developed by the authors. One method, known as the absorbed current image (AEI) technique, is ideally suited for analyzing test element group interconnects on a huge scale, while the other method, known as voltage distribution contrast (VDIC), works best for interconnects in actual devices which have relatively low resistance.