Abstract

As silicon manufacturing processes move to smaller feature sizes, new silicon fault isolation and debug challenges arise. This paper presents a methodology for silicon fault isolation/debug that allows for simultaneous probing of multiple locations on the die using static infrared emission logic state imaging. Recent tool enhancements leading to more efficient fault isolation and debug are reviewed. Cases are presented from debug of 65nm products showing how this methodology was used to achieve very low throughput times on a variety of complex new failure mechanisms.

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