Abstract

The device features have shrunk to sub-micron/nano-meter range, and the process technology has been getting more complicated, so TEM has become a necessary tool for PFA imaging and element analysis. Conventional FIB ex-situ liftout is the most common technique for precise sample preparation. But this method has some limitations: samples cannot be reprocessed for further analysis; the carbon film supported grid affects the EDS analysis for carbon elements. A new installation will be introduced in this article, which is set up in FIB chamber for in-situ lift-out application. It not only overcomes the above problems, but also covers a wide application of TEM sample preparation.

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