Secondary Ion Mass Spectrometry (SIMS) with a quadrupole detector has been used on FIB systems but it needs yields enhancement to become an effective tool. By introducing water vapor to the area of analysis, the secondary ion yield can be significantly increased for certain metals.

failure analysis, focused ion beam, quadrupole detector, secondary ion mass spectrometry
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Copyright © 2001 ASM International. All rights reserved.
2001
ASM International
Topics
Semiconductor wafer fabrication Secondary ion mass spectrometry
Issue Section:
Focused Ion Beam Microscopy
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