Abstract
Optical microscopy techniques used by forensic analysts are shown to have application to failure analysis problems. Proper set up of the optical microscope is reviewed, including the correct use of the field diaphragm and the aperture diaphragm. Polarized light microscopy, bright and dark field methods, refractive index liquids, and a particle reference atlas are used to identify contamination found on semiconductor products.
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Copyright © 2000 ASM International. All rights reserved.
2000
ASM International
Issue Section:
Poster Session
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