Abstract
Focused Ion Beam (FIB) technique has been widely used to directly modify device functionality by adding ion-induced conductive lines and cutting signal traces with chemical enhance etching. However, in this work, FIB technique is employed to add a 15 ohm resistor to a RF circuit to solve its oscillation problem. After the modification, the oscillation problem is solved and the performance of the RF device is improved significantly. The successful FIB application of adding a defined resistor to modify a circuit is reported in this paper for the first time.
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Copyright © 1998 ASM International. All rights reserved.
1998
ASM International
Topics
Semiconductor etching
Issue Section:
FIB
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