Abstract

Two cases are presented where photoemission microscopy (PEM) quickly reduced the analysis time by providing qualitative evidence of the suspected failure mechanisms. In both cases, the failures were delaying product shipments and the PEM technique was a "last hope" approach where other proposals were either not successful, or were not available to the analysts. In case one, package residue caused a leakage path that was located and confirmed by PEM. The second case required the use of PEM to observe uniformity of current flow within a polysilicon region. This second analysis provided absolute evidence that the current flow was nonuniform which supported the suspected failure mechanism. It is believed that this is the first reported observation of these two emission mechanisms during a failure analysis.

This content is only available as a PDF.
You do not currently have access to this content.