Abstract
This paper describes a simulation-based approach to contamination diagnosis. The methodology is based on the contamination-defect fault (CDF) simulator CODEF. CODEF is able to derive circuit-level faults resulting from contamination deposited on an IC cell during fabrication by simulating the manufacturing process flow. The application of CODEF in contamination diagnosis is illustrated with several examples.
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Copyright © 1996 ASM International. All rights reserved.
1996
ASM International
Issue Section:
Software Tools for Failure Analysis
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