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Published: 01 August 2013
Fig. 15 Schematic of a fluidized-bed chemical vapor deposition process More
Image
Published: 01 January 1994
Fig. 3 Chemical potential in metal-organic chemical vapor deposition processes. (a) General case. (b) Mass-transport limited growth. Source: Ref 48 More
Image
Published: 01 November 1995
Fig. 26 Physical vapor deposition process used to apply coating by sputtering More
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003218
EISBN: 978-1-62708-199-3
... Abstract Chemical vapor deposition (CVD) involves the formation of a coating by the reaction of the coating substance with the substrate. Serving as an introduction to CVD, the article provides information on metals, ceramics, and diamond films formed by the CVD process. It further discusses...
Book Chapter

Series: ASM Handbook
Volume: 13A
Publisher: ASM International
Published: 01 January 2003
DOI: 10.31399/asm.hb.v13a.a0003685
EISBN: 978-1-62708-182-5
... Abstract Vapor-deposition processes fall into two major categories, namely, physical vapor deposition (PVD) and chemical vapor deposition (CVD). This article describes major deposition processes such as sputtering, evaporation, ion plating, and CVD. The list of materials that can be vapor...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001286
EISBN: 978-1-62708-170-2
..., and postdeposition changes. It also discusses the effects and causes of growth-related properties of films deposited by physical vapor deposition processes, including residual film stress, density, and adhesion. adhesion atomistic film growth atomistically deposited films composite materials condensation...
Series: ASM Handbook
Volume: 20
Publisher: ASM International
Published: 01 January 1997
DOI: 10.31399/asm.hb.v20.a0002466
EISBN: 978-1-62708-194-8
... costly materials. It describes solidification surface treatments such as hot dip coatings, weld overlays, and thermal spray coatings. The article discusses deposition surface treatments such as electrochemical plating, chemical vapor deposition, and physical vapor deposition processes. It explains...
Series: ASM Handbook
Volume: 4A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v04a.a0005772
EISBN: 978-1-62708-165-8
... bath boriding, and fluidized-bed boriding. The article briefly describes the chemical vapor deposition process, which has emerged to be dominant among metal-boride deposition processes. borides boriding cermets chemical vapor deposition ferrous metals nonferrous metals pack cementation...
Series: ASM Handbook
Volume: 2
Publisher: ASM International
Published: 01 January 1990
DOI: 10.31399/asm.hb.v02.a0001114
EISBN: 978-1-62708-162-7
..., including powder-in-tube processing, vapor deposition processing, and melt processing. It further discusses the microstructural, anisotropy and weak link influences on these processes. high-temperature superconductors melt processing oxide powder precursor powder precursor preparation powder...
Image
Published: 01 January 1994
Fig. 2 Fundamental processes involved in metal-organic chemical vapor deposition. Source: Ref 47 More
Image
Published: 01 August 2013
Fig. 3 Advantages and disadvantages of physical and chemical vapor deposition processes. HT-CVD, high-temperature chemical vapor deposition; MT-CVD, mid-temperature chemical vapor deposition; PA-CVD, plasma-assisted chemical vapor deposition. Source: H. G. Prengel et al., 1998 More
Image
Published: 01 August 2013
Fig. 13 High-pressure compressor blades coated with physical vapor deposition process for improved wear resistance. Source: Ref 22 More
Image
Published: 01 November 1995
Fig. 29 Room-temperature bending strength as a function of composition between 67 and 79 wt% Al 2 O 3 of mullite-based ceramics produced via chemical vapor deposition processes in a combustion flame and sintered at 1600 °C (2900 °F) for 2 h. Source: Ref 69 More
Image
Published: 01 December 2004
Fig. 21 90.5WC-3.5(Ta,Ti,Nb)C-6Co alloy, 92 HRA, coated with multilayer hard coating. Microstructure shows (from bottom) cemented carbide substrate, TiN, TiCN, Al 2 O 3 , and TiN layers coated by the chemical vapor deposition process. Murakami's reagent, 1 min. 1500×. More
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001287
EISBN: 978-1-62708-170-2
... condensation thermal vaporization vacuum deposition VACUUM DEPOSITION, or vacuum evaporation, is a physical vapor deposition process in which the atoms or molecules from a vaporization source reach the substrate without colliding with residual gas molecules. Generally, the vaporization source is one...
Book Chapter

By Donald M. Mattox
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001289
EISBN: 978-1-62708-170-2
... of ion plating. bombardment film growth interface formation ion plated films ion plating nucleation physical vapor deposited films plasma-based ion plating substrate potential surface preparation ION PLATING is a generic term applied to film deposition processes in which the substrate...
Series: ASM Handbook
Volume: 22A
Publisher: ASM International
Published: 01 December 2009
DOI: 10.31399/asm.hb.v22a.a0005434
EISBN: 978-1-62708-196-2
.... It describes the modeling of vapor-surface interactions and kinetics of hetereogeneous processes as well as the modeling and kinetics of homogenous reactions in chemical vapor deposition (CVD). The article provides information on the various stages of developing models for numerical simulation of the transport...
Series: ASM Handbook
Volume: 4A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v04a.a0005808
EISBN: 978-1-62708-165-8
..., and thermokinetic phase transformations. It also describes the influence of cooling rate on laser heat treatment and the effect of processing parameters on temperature, microstructure, and case depth hardness. chemical vapor deposition electroless plating electroplating glazing hardening hardness heat...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001320
EISBN: 978-1-62708-170-2
... by the application of a thin (∼5 μm) layer of hard TiC coating to the cemented carbide tool by chemical vapor deposition (CVD) ( Ref 13 ). In the CVD coating process, the tools are heated in a sealed reactor to about 1000 °C (1830 °F) with gaseous hydrogen at atmospheric or lower pressure; volatile compounds...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001300
EISBN: 978-1-62708-170-2
... Abstract This article describes the structure of coatings produced by plasma spraying, vapor deposition, and electrodeposition processes. The main techniques used for microstructure assessment are introduced. The relationship between the microstructure and property is also discussed...