The electronic microcircuit industry has placed severe demands on metal suppliers to provide metals of the highest reproducible purity attainable as a result of the constant quest for the true values of physical and chemical properties of metals. This article describes the commonly used methods for ultrapurification of metals produced by electrolytic processes, including fractional crystallization, zone refining, vacuum melting, distillation, chemical vapor deposition, and solid state refining techniques. In addition, it describes the trace element analysis and resistance-ratio test methods used to characterize purity. Tables list the values for resistance ratios of zone-refined metals and their corresponding chemical compositions, and provide an example of the detection of impurities to concentrations in the parts per billion range, utilizing a combination of the glow discharge mass spectroscopy method and Leco combustion methods.

Neutron activation analysis (NAA) is a highly sensitive and accurate method of assaying bulk materials for trace levels of many elements. This article provides a detailed account on several types of NAA, namely, nondestructive and radiochemical thermal neutron activation, delayed neutron counting, epithermal and 14-MeV fast neutron activation, and prompt gamma activation analysis. It also includes application examples, explaining where and how each method is used and the types of elements on which they are effective.

Ultraviolet/visible (UV/VIS) absorption spectroscopy is a powerful yet cost-effective tool that is widely used to identify organic compounds and to measure the concentration of principal and trace constituents in liquid, gas, and solid test samples. This article emphasizes the quantitative analysis of elements in metals and metal-bearing ores. The instrumentation required for such applications consists of a light source, a filter or wavelength selector, and some type of visual or automated sensing mechanism. The article examines common sensing options and provides helpful information on how to set up and run a variety of UV/VIS absorption tests.

This article provides a brief account of glow discharge mass spectrometry (GDMS) for direct determination of trace elements in solid samples and for fast depth profiling in a great variety of innovative materials. It begins by describing the general principles of GDMS. This is followed by a discussion on the various components of a GDMS system as well as commercial GDMS instruments. A description of processes involved in specimen preparation and cleaning in GDMS is then presented. Various problems pertinent to multielemental calibrations in GDMS are discussed along with measures to overcome them. The article further provides information on the processes involved in the analytical setup of parameters in GDMS, covering the steps involved in the analysis of GDMS data. It ends with a section on the application and interpretation of GDMS in the metals industry.

During the melting and solidification of cast irons, certain trace (minor) elements may unintentionally accumulate to an extent that they have a detrimental effect on the microstructure of castings. This article discusses the residual elements, trace elements, and tramp elements in cast irons. Elements that influence the matrix structure of cast irons are commonly classified as ferrite-promoting elements or pearlite-promoting elements. The article describes the effects of minor elements on microstructure and properties of cast irons. It discusses the use of a combination of tools to control the effects of minor elements on the structure and properties of cast irons. The article concludes with information on allowable levels of trace and tramp elements in cast irons.

This article discusses the basic principles of inductively coupled plasma mass spectrometry (ICP-MS), covering different instruments used for performing ICP-MS analysis. The instruments covered include the sample-introduction system, ICP ion source, mass analyzer, and ion detector. Emphasis is placed on ICP-MS applications in the semiconductor, photovoltaic, materials science, and other electronics and high-technology areas.

This article provides a detailed account of the concepts and applications of neutron activation analysis (NAA), covering the basic principles and neutron reactions of NAA as well as calibration methods used for NAA. The discussion also covers the factors pertinent to analytical sensitivity achievable with NAA, common neutron sources, sample-handling technique, and automated systems of NAA. The categories of NAA covered are instrumental neutron activation analysis, epithermal neutron activation analysis, radiochemical neutron activation analysis, 14 MeV fast neutron activation analysis, delayed neutron activation analysis, and prompt gamma activation analysis.

Atomic absorption spectrometry (AAS) is generally used for measuring relatively low concentrations of approximately 70 metallic or semimetallic elemen