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semiconductor characterization

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Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006670
EISBN: 978-1-62708-213-6
... Abstract This article introduces various techniques commonly used in the characterization of semiconductors, namely single-crystal, polycrystalline, amorphous, oxide, organic, and low-dimensional semiconductors and semiconductor devices. The discussion covers material classification...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001284
EISBN: 978-1-62708-170-2
... Abstract This article describes the vapor-phase growth techniques applied to the epitaxial deposition of semiconductor films and discusses the fundamental processes involved in metal-organic chemical vapor deposition (MOCVD). It reviews the thermodynamics that determine the driving force behind...
Series: ASM Handbook
Volume: 11
Publisher: ASM International
Published: 15 January 2021
DOI: 10.31399/asm.hb.v11.a0006771
EISBN: 978-1-62708-295-2
... of use, quantification Chemical and molecular analysis, imaging Limitations Insulator analysis challenging, damaging to organics Very few Quantification difficult Major applications Semiconductors, electronics, metallurgy All industries Polymers, contamination, trace metal analysis...
Series: ASM Handbook Archive
Volume: 11
Publisher: ASM International
Published: 01 January 2002
DOI: 10.31399/asm.hb.v11.a0003534
EISBN: 978-1-62708-180-1
..., quantification Chemical and molecular analysis, imaging Limitations Semiconductive Very few Quantification difficult Major applications Semiconductors, electronics All industries Polymers, contamination, trace metal analysis References 1. “XPS Analysis of Disposable...
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006678
EISBN: 978-1-62708-213-6
... about the chemistry of the first one to several atomic layers of samples of metals, as well as of other materials, such as semiconductors and various types of thin films. A summary of surface analysis techniques is listed in Table 2 , showing the topics covered in the Surface Analysis Section of this...
Series: ASM Handbook
Volume: 2
Publisher: ASM International
Published: 01 January 1990
DOI: 10.31399/asm.hb.v02.a0001115
EISBN: 978-1-62708-162-7
... semiconductors, material produced by electrolytic processes is of insufficient purity and must be subsequently ultrapurified by one of the methods described below. The traditional system of describing metal purity is based on measuring the total impurity-element content and subtracting this...
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006652
EISBN: 978-1-62708-213-6
... organometallics; however, many materials incorporate components from multiple of the aforementioned categories as well as from inorganic components, such as semiconductors and glasses. As technology has progressed, the number and applications of these organic/inorganic composites, nanomaterials, and related...
Series: ASM Handbook
Volume: 5A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v05a.a0005731
EISBN: 978-1-62708-171-9
...- and ferrimagnetic materials may exhibit superparamagnetic properties, dielectric ceramics typically have greatly lowered dielectric constants, and normally electrically insulative materials such as ferrites and garnets are semiconductors or conductors. Therefore, optimization of a coating process is...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001300
EISBN: 978-1-62708-170-2
... second stage involves final thinning to perforation, which occurs by either electropolishing, using a fine jet of etchant, or ion beam milling, using an argon ion beam of approximately 3 kV, which is directed at the surface at a low angle (5–20°). For metals and semiconductors, the electropolishing route...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 November 1995
DOI: 10.31399/asm.hb.emde.a0003057
EISBN: 978-1-62708-200-6
... Abstract This article describes testing and characterization methods of ceramics for chemical analysis, phase analysis, microstructural analysis, macroscopic property characterization, strength and proof testing, thermophysical property testing, and nondestructive evaluation techniques...
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.9781627082136
EISBN: 978-1-62708-213-6
Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001767
EISBN: 978-1-62708-178-8
... reveal grain boundaries on unetched samples and domain boundaries in ferromagnetic alloys; and the use of voltage contrast, electron beam-induced currents, and cathodoluminescence for the characterization and failure analysis of semiconductor devices. The article compares the features of SEM with that of...
Series: ASM Handbook
Volume: 13A
Publisher: ASM International
Published: 01 January 2003
DOI: 10.31399/asm.hb.v13a.a0003600
EISBN: 978-1-62708-182-5
... CMP through a schematic illustration of CMP process equipment. The applications of CMP to tungsten and copper alloys are of prime interest in the semiconductor industry. The article discusses copper CMP and tungsten CMP in detail and analyzes polishing mechanism during CMP by application of direct...
Book: Casting
Series: ASM Handbook
Volume: 15
Publisher: ASM International
Published: 01 December 2008
DOI: 10.31399/asm.hb.v15.a0005228
EISBN: 978-1-62708-187-0
... discusses various microgravity solidification experiments that involve pure metals, alloys, and semiconductors and presents the official NASA acronyms for them. The experiments include MEPHISTO, TEMPUS, isothermal dendritic growth experiment, and advanced gradient heating facility. crystal growth...
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006641
EISBN: 978-1-62708-213-6
.... Emphasis is placed on ICP-MS applications in the semiconductor, photovoltaic, materials science, and other electronics and high-technology areas. inductively coupled plasma mass spectrometry mass analyzer References 1. Montaser A. , Minnich M.G. , McLean J.A...
Series: ASM Handbook
Volume: 4C
Publisher: ASM International
Published: 09 June 2014
DOI: 10.31399/asm.hb.v04c.a0005836
EISBN: 978-1-62708-167-2
... thyristor, showing four layers of alternating N and P-type material Fig. 9 Switching characteristics of conventional thyristor Fig. 10 Diagram comparing structures of the insulated-gate bipolar transistor (IGBT) and the metal-oxide semiconductor field-effect transistor (MOSFET...
Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001737
EISBN: 978-1-62708-178-8
... Abstract Spark source mass spectrometry (SSMS) is an analytical technique used for determining the concentration of elements in a wide range of solid samples, including metals, semiconductors, ceramics, geological and biological materials, and air and water pollution samples. This article...
Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001772
EISBN: 978-1-62708-178-8
... Abstract Field ion microscopy (FIM) can be used to study the three-dimensional structure of materials, such as metals and semiconductors, because successive atom layers can be ionized and removed from the surface by field evaporation. The ions removed from the surface by field evaporation can...
Series: ASM Handbook Archive
Volume: 10
Publisher: ASM International
Published: 01 January 1986
DOI: 10.31399/asm.hb.v10.a0001736
EISBN: 978-1-62708-178-8
... Abstract This article introduces the principles of Raman spectroscopy and the representative materials characterization applications to which Raman spectroscopy has been applied. It includes a discussion of light-scattering fundamentals and a description of the experimental aspects of the...
Book Chapter

Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006685
EISBN: 978-1-62708-213-6
... Abstract This article introduces the principles of Raman spectroscopy and the representative materials characterization applications to which Raman spectroscopy has been applied. A discussion on light-scattering fundamentals and a description of the experimental aspects of the technique are...