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plasma-enhanced chemical vapor deposition

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Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001285
EISBN: 978-1-62708-170-2
...Plasma-enhanced chemical vapor deposition of refractory metal films Table 1 Plasma-enhanced chemical vapor deposition of refractory metal films Material Reactant gases Deposition temperature Post- deposition anneal References °C °F W WF 6 , H 2 350–400 660–750 1000 °C...
Series: ASM Handbook
Volume: 18
Publisher: ASM International
Published: 31 December 2017
DOI: 10.31399/asm.hb.v18.a0006360
EISBN: 978-1-62708-192-4
... vapor deposition processes using specialized vacuum equipment. Chemical vapor deposition is performed when gas phase chemical species are energetically manipulated to condense on the substrate and form a coating. Chemical vapor deposition may be performed using thermal or plasma-enhanced (PECVD) methods...
Series: ASM Handbook
Volume: 5A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v05a.a0005749
EISBN: 978-1-62708-171-9
... deposition PA-PVD plasma-assisted physical vapor deposition PE-CVD plasma-enhanced chemical vapor deposition PEL permissible exposure limits pH negative logarithm of hydrogen-ion activity PH precipitation hardenable PI polyimide PLC programmable logic controller...
Book Chapter

By Donald M. Mattox
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001289
EISBN: 978-1-62708-170-2
... Nitride , J. Vac. Sci. Technol. A , Vol 1 ( No. 2 ), 1983 , p 323 10.1116/1.572124 92. Jansen F. , Kuhman D. , and Taber C. , Plasma Enhanced Chemical Vapor Deposition using Forced Flow through Hollow Cathodes , J. Vac. Sci. Technol. A , Vol 7 ( No. 6 ), 1989 , p 3176...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0005586
EISBN: 978-1-62708-170-2
... PAO polyalphaolefin PAPVD plasma-assisted physical vapor deposition PBT polybutylene terephthalate PCD polycrystalline diamond Pe Péclet number PECVD plasma-enhanced chemical vapor deposition PEM plasma emission monitor PES polyether sulfone...
Book Chapter

Series: ASM Handbook
Volume: 13A
Publisher: ASM International
Published: 01 January 2003
DOI: 10.31399/asm.hb.v13a.a0003685
EISBN: 978-1-62708-182-5
.... , Plasma-Enhanced Chemical Vapor Deposition , p 532 – 537 Other reference source • Decher G. and Schlenoff J.B. , Ed., Multilayer Thin Films: Sequential Assembly of Nanocomposite Materials , Wiley-VCH , 2003 • Hitchman M.L. and Jensen K.F. , Ed., Chemical Vapor...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001283
EISBN: 978-1-62708-170-2
.... , The Many Faces of Boron Nitride , Mater. Eng. , Nov 1990 , p 41 – 44 35. Marks J. , Witty D. , Short A. , Laford W. , and Nguyen B. , Properties of High Quality Nitride Films by Plasma Enhanced Chemical Vapor Deposition , Proc. 11th Int. Conf. on CVD , Spear K...
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006633
EISBN: 978-1-62708-213-6
...Measured vertical spring constants and natural frequencies of triangular (V-shaped) cantilevers made of plasma-enhanced chemical vapor deposition Si<sub>3</sub>N<sub>4</sub> Table 1 Measured vertical spring constants and natural frequencies of triangular (V-shaped) cantilevers made of plasma...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001320
EISBN: 978-1-62708-170-2
... of plasma-assisted CVD for hard coatings on cemented carbide substrates is not yet widespread, probably due in part to the process economics relative to the competing CVD and PVD methods. Additional information is available in the article “Plasma-Enhanced Chemical Vapor Deposition” in this Volume...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001319
EISBN: 978-1-62708-170-2
... terephthalate Process Material Thickness, Å O 2 rate, cc/m 2 /day H 2 O rate, g/m 2 /day Resistance evaporation SiO 600 2.2 2.5 Electron-beam evaporation SiO 600 3.0 2.0 Plasma-enhanced chemical vapor deposition SiO 2 200 1.0 1.0 Source: Ref 64 Physical properties...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001286
EISBN: 978-1-62708-170-2
... to the increased nucleation density. In the case of a plasma system such as plasma-enhanced chemical vapor deposition (PECVD), the radicals, unique species, and excited species formed in the plasma may play an important role in adsorption and deposition from a gaseous precursor. For example, in the deposition...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001290
EISBN: 978-1-62708-170-2
...; plasma-enhanced chemical vapor deposition; and certain forms of ion plating in which both the evaporant flux and ion flux are derived by extraction from a plasma. Therefore, there is more control over the deposition parameters in the IBAD process, because the ion flux and the evaporant flux can be varied...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 November 1995
DOI: 10.31399/asm.hb.emde.a0003054
EISBN: 978-1-62708-200-6
... of 0.5 to 10 torr (0.65 to 1.3 kPa), voltages should be kept below 40 V to avoid plasma formation. Operation in a vacuum is the preferred method for processing ceramics in a graphite furnace. The level of vacuum is limited by furnace cleanliness and the vapor pressure of the graphite. Sublimation...
Series: ASM Handbook
Volume: 5A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v05a.a0005707
EISBN: 978-1-62708-171-9
... Thermochemical Surface Modification Electroplating Anodizing Conventional CVD Plasma-Assisted CVD (PACVD) or Plasma-Enhanced CVD (PECVD) Laser-Assisted CVD Advantages and Disadvantages of CVD Applications for CVD Coatings Evaporation Cathodic Arc Deposition Molecular Beam Epitaxy...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003218
EISBN: 978-1-62708-199-3
... transport; chemistry of the reaction; and processing parameters of temperature, pressure, and chemical activity. Chemical vapor deposition processes can be classified as either open-reactor systems, including thermal CVD and plasma CVD, or as a closed-reactor system, as in pack cementation...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003218
EISBN: 978-1-62708-199-3
... by thermodynamics; kinetics; mass transport; chemistry of the reaction; and processing parameters of temperature, pressure, and chemical activity. CVD Processes Chemical vapor deposition processes can be classified as either open-reactor systems, including thermal CVD and plasma CVD, or as a closed-reactor...
Series: ASM Handbook
Volume: 22A
Publisher: ASM International
Published: 01 December 2009
DOI: 10.31399/asm.hb.v22a.a0005434
EISBN: 978-1-62708-196-2
... Topics Modeling Complex/Multiphysics Processes Involving Vapors Example 1: Plasma-Enhanced CVD (PECVD) Example 2: Fluidized-Bed CVD (FB-CVD) Multiscale Modeling Concurrent Analysis Examples of Multiscale Simulations of VPP PVD on Micron- or Submicron-Sized Features CVD...
Series: ASM Handbook
Volume: 18
Publisher: ASM International
Published: 31 December 2017
DOI: 10.31399/asm.hb.v18.a0006421
EISBN: 978-1-62708-192-4
.../S0040-6090(96)09145-6 162. Cibert C. , Hidalgo H. , et al. , Properties of Aluminum Oxide Thin Films Deposited by Pulsed Laser Deposition and Plasma Enhanced Chemical Vapor Deposition , Thin Solid Films , Vol 516 ( No. 6 ), 2008 , p 1290 – 1296 10.1016/j.tsf.2007.05.064...
Series: ASM Handbook
Volume: 5A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v05a.a0005733
EISBN: 978-1-62708-171-9
.... and Zhu D. , “Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective Coatings,” NASA Technical Reports Server, National Aeronautics and Space Administration , uploaded April 18 , 2011 , http://naca.larc.nasa.gov/search.jsp?R=20110008752&amp;qs=N%3D4294966387%2B4294364924...
Series: ASM Handbook
Volume: 4A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v04a.a0005771
EISBN: 978-1-62708-165-8
... in an atmosphere of a volatile compound of the coating material (out-of-contact gas-phase deposition, or chemical vapor deposition). As the coating bond is developed by diffusion, the bond strength is enhanced. Solid-state diffusion methods include pack cementation, which is the most widely employed diffusion...