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plasma film deposition

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Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001319
EISBN: 978-1-62708-170-2
... on contamination removal, plasma surface modification, plasma-induced grafting, and plasma film deposition. References References 1. Boenig H.V. , Plasma Science and Technology , Cornell University Press , 1982 2. Morosoff N. , Crist B. , Bumgarner M. , Hsu T...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001285
EISBN: 978-1-62708-170-2
...Plasma-enhanced chemical vapor deposition of refractory metal films Table 1 Plasma-enhanced chemical vapor deposition of refractory metal films Material Reactant gases Deposition temperature Post- deposition anneal References °C °F W WF 6 , H 2 350–400 660–750 1000 °C...
Book Chapter

By S.L. Rohde
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001288
EISBN: 978-1-62708-170-2
... glow discharge sputtering magnetron sputtering nonreactive sputtering plasma formation process control radio-frequency sputtering reactive sputtering sputter deposition sputtered films triode sputtering unbalanced magnetron sputtering SPUTTERING is a nonthermal vaporization process...
Book Chapter

By Donald M. Mattox
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001289
EISBN: 978-1-62708-170-2
..., and applications of ion plating. bombardment film growth interface formation ion plated films ion plating nucleation physical vapor deposited films plasma-based ion plating substrate potential surface preparation ION PLATING is a generic term applied to film deposition processes in which...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001291
EISBN: 978-1-62708-170-2
... ), 1988 , p 176 – 182 15. Ehrich H. , The Anodic Vacuum Arc. I. Basic Construction and Phenomenology , J. Vac. Sci. Technol. , Vol A6 ( No. 1 ), 1988 , p 134 – 138 10.1116/1.574995 16. Ehrich H. et al. , Plasma Deposition of Thin Films Utilizing the Anodic Vacuum Arc...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001286
EISBN: 978-1-62708-170-2
... the nucleation of the deposited species. The presence of adsorbed oxygen or oxygen in a plasma or bombarding oxygen ion beam during deposition has been shown to aid in the adhesion of gold ( Ref 20 ) and oxygen-active film materials ( Ref 21 ) to oxide substrates. The increased adhesion is attributed...
Series: ASM Handbook
Volume: 5A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v05a.a0005736
EISBN: 978-1-62708-171-9
... of thermal spray processes cannot truly produce a thin film in its strictest sense. (An exception is the low-pressure plasma spray/chemical vapor deposition process, which is capable of producing coatings in the thin-film range [ Ref 5 ].) However, thin-film technology used in semiconductor electronics now...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001287
EISBN: 978-1-62708-170-2
.... , Stewart W.C. , and Owen H.A. , A New Deposition Technique for Refractory Metal Films , Trans. 8th AVS Nat. Symp. , 1962 , p 988 69. Sanders D. , Vacuum Arc-Based Processing, Chapter 18 , Handbook of Plasma Processing Technology , Rossnagel S.M. , Cuomo J.J...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001294
EISBN: 978-1-62708-170-2
... deposition conditions are: In general, the angular distribution of material from the laser-generated plasma is sharply peaked with respect to the target normal, with some tilting of the distribution toward the incident laser beam. Early studies on the PLD of multicomponent films indicated...
Series: ASM Handbook
Volume: 18
Publisher: ASM International
Published: 31 December 2017
DOI: 10.31399/asm.hb.v18.a0006360
EISBN: 978-1-62708-192-4
.... and Lichtenberg A.J. , Principles of Plasma Discharges and Materials Processing , John Wiley & Sons, Inc. , New York , 1994 7. Smith D.L. , Thin-Film Deposition: Principles and Practice , McGraw Hill , Boston , 1995 8. Robertson J. , Diamond-like Amorphous Carbon , Mat...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003218
EISBN: 978-1-62708-199-3
...Abstract Abstract Chemical vapor deposition (CVD) involves the formation of a coating by the reaction of the coating substance with the substrate. Serving as an introduction to CVD, the article provides information on metals, ceramics, and diamond films formed by the CVD process. It further...
Series: ASM Handbook
Volume: 5A
Publisher: ASM International
Published: 01 August 2013
DOI: 10.31399/asm.hb.v05a.a0005707
EISBN: 978-1-62708-171-9
... is biased negatively and the coating material and/or an inert gas (argon) is ionized in a gas plasma. The substrate surface and/or the depositing film thus are subjected to a flux of high-energy ions sufficient to cause changes in the interfacial region or film properties, compared to the nonbombarded...
Series: ASM Desk Editions
Publisher: ASM International
Published: 01 December 1998
DOI: 10.31399/asm.hb.mhde2.a0003218
EISBN: 978-1-62708-199-3
... Abstract Chemical vapor deposition (CVD) involves the formation of a coating by the reaction of the coating substance with the substrate. Serving as an introduction to CVD, the article provides information on metals, ceramics, and diamond films formed by the CVD process. It further discusses...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001300
EISBN: 978-1-62708-170-2
...Abstract Abstract This article describes the structure of coatings produced by plasma spraying, vapor deposition, and electrodeposition processes. The main techniques used for microstructure assessment are introduced. The relationship between the microstructure and property is also discussed...
Book Chapter

Series: ASM Handbook
Volume: 13A
Publisher: ASM International
Published: 01 January 2003
DOI: 10.31399/asm.hb.v13a.a0003685
EISBN: 978-1-62708-182-5
.... , Plasma-Enhanced Chemical Vapor Deposition , p 532 – 537 Other reference source • Decher G. and Schlenoff J.B. , Ed., Multilayer Thin Films: Sequential Assembly of Nanocomposite Materials , Wiley-VCH , 2003 • Hitchman M.L. and Jensen K.F. , Ed., Chemical Vapor...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001283
EISBN: 978-1-62708-170-2
.... , Characterization of Microwave ECR Plasma for Low Temperature Chemical Vapor Deposition , Proc. 11th Int. Conf. on CVD , Spears K. and Cullen G. , Ed., Electrochemical Society , 1990 , p 166 – 172 10. Bunshah R.F. , Ed., Handbook of Deposition Technologies for Films and Coatings , 2nd...
Series: ASM Handbook
Volume: 10
Publisher: ASM International
Published: 15 December 2019
DOI: 10.31399/asm.hb.v10.a0006641
EISBN: 978-1-62708-213-6
... Co <1 73 Ni 3 83 Cu <1 93 Zn 9 78 Laser ablation inductively coupled plasma mass spectrometry analysis results from yttrium oxide films and ceramic coating Table 5 Laser ablation inductively coupled plasma mass spectrometry analysis results from yttrium oxide films...
Series: ASM Handbook
Volume: 5
Publisher: ASM International
Published: 01 January 1994
DOI: 10.31399/asm.hb.v05.a0001290
EISBN: 978-1-62708-170-2
... position, which represents a defect in the crystalline structure. This defect can be eliminated by a subsequent collision or it can remain in the film. The atomic displacement mechanisms in the bulk of the film depicted in Fig. 2 are generic to any energetic deposition process. The plasma and surface...
Series: ASM Handbook
Volume: 18
Publisher: ASM International
Published: 31 December 2017
DOI: 10.31399/asm.hb.v18.a0006434
EISBN: 978-1-62708-192-4
... of the interaction Van der Waals Hydrogen σ or π Energy (eV/bond) 0.08 0.2 0.4−0.8 Schematic of the interaction (environment) DLC = diamondlike coating. Source: Ref 48 Friction and wear coefficients for C:H coatings synthesized by plasma-assisted chemical vapor deposition using...
Series: ASM Handbook
Volume: 22A
Publisher: ASM International
Published: 01 December 2009
DOI: 10.31399/asm.hb.v22a.a0005434
EISBN: 978-1-62708-196-2
... illustrating its application to VPP through a few representative examples. Several books or comprehensive review papers are cited throughout this section for further reading on the subject. Fluidized-Bed CVD (FB-CVD) consists of depositing films over particles forming a bed that expands when swept by a gas...